UUÖ±²¥

Laboratory and fabrication equipment:

The Cheng Lab has a 925-square-foot laboratory space divided into three rooms provided by UUÖ±²¥. 

The two adjacent bigger rooms are designed for miro- and nanofabrication use, suitable for photolithography and film deposition:

• a 100-square-foot class 1000 soft curtain cleanroom with purify water system and the ceiling lighting suitable for photolithography
• AJA ATC Orion 5-source Sputtering Deposition System
• Karl Suss MJB 3 Mask Aligner
• Filmetrics thin film measurement system
• three chemical hoods with in-house vacuum, compressed air and gas lines
• the ultrasound cleaner and programmable hotplate for photolithography procedure
• TMC vibration isolated optical table
• ETS humidity control chamber
• Princeton Applied Research potentiostat (VersaSTAT-200) for template electrochemical deposition

The third room provides a quiet space for computer simulation and data analysis.

Computers:

• Two workstations with the Mumax and OOMMF software packages, Mathematica and MatLab software installed for micromagnetic simulation is located in the computer room.
• Several networked computers with appropriate instrument control and data analysis software are available in the nanofabricaiton rooms.

Characterization equipment:

The Cheng group shares or has free access to the following on-campus major instruments:

• PMS MicroMag^TM3900 VSM magnetometer
• Agilent 5500 scanning probe microscope with atomic force microscopy and scanning tunneling microscopy capabilities
• Rigaku Ultima IV X-ray diffraction (XRD)

The Cheng group has free access through general user proposals to the following DOE user facilities:

• X-ray magnet circular dichroism spectroscopy and x-ray PEEM imaging at the Advanced Light Source of Lawrence Berkeley National Laboratory
• X-ray magnet circular dichroism spectroscopy at the Advanced Photon Source of Argonne National Laboratory

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